At the beginning of 2016 the book Vacuum Science and Technology - a completely new international edition of the Dutch standard work Basisboek Vacuümtechniek - will be released by The High Tech Institute.
In this English edition dr. ir. Bert Suurmeijer, ing. Theo Mulder and dr. ir. Jan Verhoeven have included all relevant knowledge and updates for anybody who works in research, instrumentation, development or production of vacuum technology. The authors have added important updates on vacuum pumps, pressure measurement, ion sources, leak detection and cleaning and working discipline.
Since the time Basisboek Vacuümtechniek was released by the Dutch Vacuum Society NEVAC in the year 2000, both industry and science have made significant progress in the field of vacuum technology. Vacuum has entered into more industries and areas of research and it forms the basis for higher revenues, precision and efficiency. The production of solar cells and organic displays has left its infancy, science has focused en masse on nano-related subjects and meanwhile the chip industry is on the brink of performing the most crucial step in the IC production, lithography, in vacuum. ‘It is not exaggerated to say that without the ability to evacuate small and large volumes we would still be at the technological level of the of the early 20th century,’ the authors justly state.
It took a few years, but now there is a very detailed reference book on vacuum physics and technology that is completely up to date. The authors have totally revised the chapter on leak detection. This was done because the maximum achievable sensitivity of counterflow leak detection has increased significantly in the past decade. Aside from that two inside-out leak detection methods are added, namely the atmosphere method and the bombing method.
Interesting spin-off: with the English edition of Vacuum Science and Technology Suurmeijer, Mulder and Verhoeven put the Netherlands on the map as the center of vacuum-related top technology.
In the book the authors emphasize the basic physics and principles that form the foundation of modern technology. The book is an excellent reference book and training manual with a clear layout: there is a separation between medium and higher levels, which makes it suitable for training in various disciplines. Exercises are included in two degrees of difficulty.
About the authors
Bert Suurmeijer worked at the group Surface Physics and Thin Films of the department of Technical Physics of Rijksuniversiteit Groningen. Theo Mulder worked at the IKO (Now: National Institute for Subatomic Physics or Nikhef) in Amsterdam and was later employed as sales engineer at Leybold, a German supplier of vacuum technology, for 25 years. Jan Verhoeven supervised several groups conducting vacuum related research at the FOM Institute AMOLF in Amsterdam. Since 2007 he works as an independent consultant in the field of thin film and multilayer x-ray optics. Verhoeven is visiting scientist at the Advanced Research Centre for Nano Lithography (ARCNL).
The authors are honorary members of NEVAC. Suurmeijer and Mulder are also members of the training committee of this organization.